Perfect for portraiture, the XF 56mm f/1.2 R from FUJIFILM
is an 85mm-equivalent prime distinguished by its exceedingly fast f/1.2
maximum aperture for isolating subjects and working in low-light
conditions. The optical design employs both aspherical and extra-low
dispersion elements, which help to reduce a variety of aberrations,
color fringing, and distortion in order to achieve high sharpness and
clarity. A Super EBC coating is used, too, to reduce flare and ghosting
for improved contrast and color accuracy in bright and backlit
conditions. Additionally, this lens also features an internal focusing
mechanism for quick focusing performance along with a rounded
seven-blade diaphragm to produce a pleasing bokeh quality.
